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11Trusted Integrated Chips (TIC) Safe and Secure Operations Office Dennis L. Polla, Ph.D. Acting Director SSO TIC Proposers’ Day

Trusted Integrated Chips (TIC) Safe and Secure Operations Office Dennis L. Polla, Ph.D. Acting Director SSO TIC Proposers’ Day

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Source URL: www.iarpa.gov

Language: English - Date: 2014-03-06 18:49:41
123D IC WORKING GROUP MEETING JULY 17, 2013 3D IC Working Group Meeting Agenda  2:00 pm

3D IC WORKING GROUP MEETING JULY 17, 2013 3D IC Working Group Meeting Agenda  2:00 pm

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Source URL: www.gsaglobal.org

Language: English - Date: 2014-01-22 10:41:26
13A Comparison of 3D Package Designs: Traditional Organic Substrates and Advanced Silicon Interposers GSA 3DIC Stacking Working Group Meeting July 17, 2013

A Comparison of 3D Package Designs: Traditional Organic Substrates and Advanced Silicon Interposers GSA 3DIC Stacking Working Group Meeting July 17, 2013

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Source URL: www.gsaglobal.org

Language: English - Date: 2014-01-22 10:42:15
14Next-generation Key CMOS Technologies  R&D of LSIs Aiming at High Reliability, High Performance and Low Power Consumption HAYASHI Yoshihiro Abstract

Next-generation Key CMOS Technologies R&D of LSIs Aiming at High Reliability, High Performance and Low Power Consumption HAYASHI Yoshihiro Abstract

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Source URL: www.nec.com

Language: English - Date: 2012-09-11 09:28:27
15Micro Technologies For more information on partnering with the Kansas City Plant, contact: Office of Business Development

Micro Technologies For more information on partnering with the Kansas City Plant, contact: Office of Business Development

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Source URL: honeywell.com

Language: English - Date: 2012-04-26 07:29:47
16F R A U N H O F E R I n s t i t u t e for E l e c t roni c N ano S y s t e m s E N A S  Back-End of line 1

F R A U N H O F E R I n s t i t u t e for E l e c t roni c N ano S y s t e m s E N A S Back-End of line 1

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Source URL: www.enas.fraunhofer.de

Language: English - Date: 2015-01-15 07:05:47
173D INTEGRATION: TSV PROCESSES AND WAFER THINNING 1

3D INTEGRATION: TSV PROCESSES AND WAFER THINNING 1

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Source URL: www.enas.fraunhofer.de

Language: English - Date: 2015-01-15 16:05:10
18Fraunhofer IPMS Center Nanoelectronic Technologies (CNT)  Equipment & Capabilities for 200 & 300 mm  www.cnt.fraunhofer.de

Fraunhofer IPMS Center Nanoelectronic Technologies (CNT) Equipment & Capabilities for 200 & 300 mm www.cnt.fraunhofer.de

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Source URL: www.ipms.fraunhofer.de

Language: English - Date: 2015-01-15 15:06:10
19Robust TSV Via­Middle and Via­Reveal Process Integration Accomplished through Characterization and Management of Sources of Variation

Robust TSV Via­Middle and Via­Reveal Process Integration Accomplished through Characterization and Management of Sources of Variation

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Source URL: www.appliedmaterials.com

Language: English - Date: 2014-05-27 18:47:55
201  Assembly and Packaging Difficult Challenges Difficult Challenges[removed]Summary of Issues

1 Assembly and Packaging Difficult Challenges Difficult Challenges[removed]Summary of Issues

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Source URL: public.itrs.net

Language: English - Date: 2014-03-31 09:28:23